Groove depth uniformization in (110) Si anisotropic etching by ultrasonic wave and application to accelerometer fabrication

Proceedings of the IEEE Micro Electro Mechanical Systems

Volumn , Issue , 1995, Pages 100-105

  Ohwada, K ^a   Negoro, Y ^a   Konaka, Y ^a   Oguchi, T ^a  

^a MURATA MANUFACTURING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION; ACCELEROMETERS; AMPLIFIERS (ELECTRONIC); ANISOTROPY; CAPACITANCE; ELECTRIC CONVERTERS; ELECTRODES; ETCHING; FREQUENCIES; SENSORS; SILICON WAFERS; SWITCHING;

COMB TYPE NARROW GAP ELECTRODES; DYNASHOCK WAVES; GROOVE DEPTH UNIFORMIZATION; SILICON ANISOTROPIC ETCHING;

ULTRASONIC WAVES;

EID: 0029204406     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)