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3
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0041765447
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Conf. Ser. No. 137, Inst. of Physics, Bristol, Philadelphia
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M. Shur, B. Gelmont, C. Saavedra-Munoz and G. Kelner, Proc. 5th Conf. Silicon Carbide and Related Compounds, Conf. Ser. No. 137, Inst. of Physics, Bristol, Philadelphia, 1994, p. 465.
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Proc. 5th Conf. Silicon Carbide and Related Compounds
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Shur, M.1
Gelmont, B.2
Saavedra-Munoz, C.3
Kelner, G.4
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4
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0042767336
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Conf. Ser. No. 137, Inst. of Physics, Bristol, Philadelphia
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R.P. Joshi and P.K. Raha, Proc. 5th Conf. Silicon Carbide and Related Compounds, Conf. Ser. No. 137, Inst. of Physics, Bristol, Philadelphia, 1994, p. 687.
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Joshi, R.P.1
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Brennan, K.F.3
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Wang, Y.6
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6
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0043268553
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GaN based field effect transistors
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M. Willander and H. Hartnagel (eds.), Chapman, London
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M. Shur and A. Khan, GaN based field effect transistors, in M. Willander and H. Hartnagel (eds.), High Temperature Electronics, Chapman, London, 1996.
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High Temperature Electronics
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Shur, M.1
Khan, A.2
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7
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0003905889
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Prentice Hall, Englewood Cliffs, NJ
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K. Lee, M. Shur, T. Fjeldly, and T. Ytterdal, Semiconductor Device Modeling for VLSI, Prentice Hall, Englewood Cliffs, NJ, 1993.
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(1993)
Semiconductor Device Modeling for VLSI
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Lee, K.1
Shur, M.2
Fjeldly, T.3
Ytterdal, T.4
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8
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21544459418
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Current-voltage characteristics of strained piezoelectric structures
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A. Bykhovski, B. Gelmont, M.S. Shur and A. Khan, Current-voltage characteristics of strained piezoelectric structures, J. Appl. Phys., 75 (1995) 1616-1620.
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Bykhovski, A.1
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9
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85051998502
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High transconductance heterostructure field effect transistors based on AlGaN/GaN
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accepted for publication
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Q. Chen, M.A. Khan, J.W. Yang, C.J. Sun, M.S. Shur and H. Park, High transconductance heterostructure field effect transistors based on AlGaN/GaN, Appl. Phys. Lett., accepted for publication.
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Appl. Phys. Lett.
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Chen, Q.1
Khan, M.A.2
Yang, J.W.3
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10
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0001446923
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Hall measurements and contact resistance in doped GaN/AlGaN heterostructures
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M.A. Khan, M.S. Shur and Q. Chen, Hall measurements and contact resistance in doped GaN/AlGaN heterostructures, Appl. Phys. Lett., 68 (21) (1996) 3022-3024.
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11
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0030181719
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Microwave operation of GaN/AlGaN doped channel heterostructure field effect transistors
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M. Asif Khan, Q. Chen, M.S. Shur, B.T. Dermott and J.A. Higgins, Microwave operation of GaN/AlGaN doped channel heterostructure field effect transistors, IEEE Elect. Dev. Letts., 17 (7) (1996) 325-327.
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IEEE Elect. Dev. Letts.
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Asif Khan, M.1
Chen, Q.2
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Dermott, B.T.4
Higgins, J.A.5
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12
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4244076916
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The Electrochemical Society, New Jersey
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M.S. Shur and M. Asif Khan, in F. Ren, D.N. Buckley, S.J. Pearton, P. Van Daele, G.C. Chi, T. Kamijoh and F. Schuermeyer (eds.), Proc. Symp. Wide Band Gap Semiconductors and the Twenty-Third State-of-the-Art Program on Compound Semiconductors (SOTAPOCS III), The Electrochemical Society, New Jersey, Vol. 95-21, 1995, p. 128.
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Proc. Symp. Wide Band Gap Semiconductors and the Twenty-Third State-of-the-Art Program on Compound Semiconductors (SOTAPOCS III)
, vol.21-95
, pp. 128
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Shur, M.S.1
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Pearton, S.J.5
Van Daele, P.6
Chi, G.C.7
Kamijoh, T.8
Schuermeyer, F.9
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13
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5244278122
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High Electron mobility in two-dimensional electrons gas in AlGaN/GaN heterostructures and in bulk GaN
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M.S. Shur, B. Gelmont and M. Asif Khan, High Electron mobility in two-dimensional electrons gas in AlGaN/GaN heterostructures and in bulk GaN, J. Elect. Mater., 25 (5) (1996) 777-785.
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J. Elect. Mater.
, vol.25
, Issue.5
, pp. 777-785
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Gelmont, B.2
Asif Khan, M.3
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14
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21544481110
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2-Dimensional electron gas in GaN-AlGaN heterostructures deposited using trimethylamine-alane as the aluminum source in low pressure metalorganic chemical vapor deposition
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M. Asif Khan, Q. Chen, C.J. Sun, M.S. Shur and B.L. Gelmont, 2-Dimensional electron gas in GaN-AlGaN heterostructures deposited using trimethylamine-alane as the aluminum source in low pressure metalorganic chemical vapor deposition, Appl. Phys. Lett., 67 (10) (1995) 1429-1431.
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Appl. Phys. Lett.
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The fabrication of recessed gate GaN MODFETs
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Inst. Conf. Ser. No. 145, Ch. 4
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J. Burm, W.J. Schaff and L.F. Eastman, The fabrication of recessed gate GaN MODFETs, Proc. 22nd Int. Symp. GaAs and Related Compounds, 1995, Inst. Conf. Ser. No. 145, Ch. 4, 1996, p. 605-608.
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Proc. 22nd Int. Symp. GaAs and Related Compounds, 1995
, pp. 605-608
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Burm, J.1
Schaff, W.J.2
Eastman, L.F.3
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0001446923
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Hall measurements and contact resistance in doped GaN/AlGaN heterostructures
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M.A. Khan, M.S. Shur and Q. Chen, Hall measurements and contact resistance in doped GaN/AlGaN heterostructures, Appl. Phys. Lett., 68 (21) (1996) 3022-3024.
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Appl. Phys. Lett.
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The Electrochemical Society, NJ
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S. Binari, in F. Ren, D.N. Buckley, S.J. Pearton, P. Van Daele, G.C. Chi, T. Kamijoh and F. Schuermeyer (eds.), Proc. Symp. Wide Band Gap Semiconductors and the Twenty-Third State-of-the-Art Program on Compound Semiconductors (SOTAPOCS III), The Electrochemical Society, NJ, Vol. 95-21, 1995.
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Chi, G.C.6
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M.A. Khan, J.N. Kuznia, D.T. Olson, W. Schaff, J. Burm and M.S. Shur, Appl. Phys. Lett., 65 (1994) 1121-1123.
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27
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0001420729
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GaN/AlGaN field effect transistors for high temperature applications
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Inst. Phys. Conf. Ser. No. 141, Ch. 4
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M.S. Shur, A. Khan, B. Gelmont, R.J. Trew and M.W. Shin, GaN/AlGaN field effect transistors for high temperature applications, Int. Symp. Compound Semiconductors, San Diego, CA, 1994, Inst. Phys. Conf. Ser. No. 141, Ch. 4, 1995, pp. 419-424.
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Int. Symp. Compound Semiconductors, San Diego, CA, 1994
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28
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Proc. High Temp. Conf., Albuquerque, NM, 1996.
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CW operation of short channel GaN/AlGaN doped channel heterostructure field effect transistors at 10 GHz and 15 GHz
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30
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Eastman, L.F.8
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