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Volumn 46, Issue 1-3, 1997, Pages 69-73

GaN based transistors for high temperature applications

Author keywords

Cutoff frequency; Energy gap; Gate length

Indexed keywords

CARRIER CONCENTRATION; CRYSTAL IMPURITIES; ELECTRIC RESISTANCE; ENERGY GAP; HIGH TEMPERATURE APPLICATIONS; HIGH TEMPERATURE PROPERTIES; IONIZATION; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM COMPOUNDS; THERMAL EFFECTS; TRANSPORT PROPERTIES;

EID: 0031121571     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5107(96)01935-6     Document Type: Article
Times cited : (23)

References (30)
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  • 8
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  • 9
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    • High transconductance heterostructure field effect transistors based on AlGaN/GaN
    • accepted for publication
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    • Appl. Phys. Lett.
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  • 10
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    • Hall measurements and contact resistance in doped GaN/AlGaN heterostructures
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    • Microwave operation of GaN/AlGaN doped channel heterostructure field effect transistors
    • M. Asif Khan, Q. Chen, M.S. Shur, B.T. Dermott and J.A. Higgins, Microwave operation of GaN/AlGaN doped channel heterostructure field effect transistors, IEEE Elect. Dev. Letts., 17 (7) (1996) 325-327.
    • (1996) IEEE Elect. Dev. Letts. , vol.17 , Issue.7 , pp. 325-327
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  • 13
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  • 14
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    • 2-Dimensional electron gas in GaN-AlGaN heterostructures deposited using trimethylamine-alane as the aluminum source in low pressure metalorganic chemical vapor deposition
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.