메뉴 건너뛰기




Volumn 53, Issue 1, 1996, Pages 1110-1124

Modeling of nonlocal electron kinetics in a low-pressure inductively coupled plasma

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001580544     PISSN: 1063651X     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevE.53.1110     Document Type: Article
Times cited : (30)

References (31)
  • 1
    • 0003730831 scopus 로고
    • Principles of Plasma Discharges and Materials Processing
    • John Wiley & Sons, Inc., New York
    • M.A. Lieberman and A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (John Wiley & Sons, Inc., New York, 1994).
    • (1994)
    • Lieberman, M.A.1    Lichtenberg, A.J.2
  • 6
    • 0003631533 scopus 로고
    • Plasma Physics via Computer Simulation
    • McGraw Hill, New York
    • C.K. Birdsall and A.B. Langdon, Plasma Physics via Computer Simulation (McGraw Hill, New York, 1985);
    • (1985)
    • Birdsall, C.K.1    Langdon, A.B.2
  • 7
    • 0003569545 scopus 로고    scopus 로고
    • Computer Simulation Using Particles
    • IOP Publishing, Bristol
    • R.W. Hockney and J.W. Eastwood, Computer Simulation Using Particles (IOP Publishing, Bristol, 1988);
    • Hockney, R.W.1    Eastwood, J.W.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.