The scaling of CVD rotating disk reactors to large sizes and comparison with theory

Journal of Electronic Materials

Volumn 25, Issue 9, 1996, Pages 1487-1494

  Thompson, Alan G ^a   Stall, R A ^a   Zawadzki, P ^a   Evans, G H ^b  

^a EMCORE CORPORATION   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

AlGaAs; CVD; InGaAlP; MOCVD; Rotating disk reactors

Indexed keywords

EID: 0005485303     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02655388     Document Type: Article

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