Performance optimization of a high-repetition-rate krf laser plasma x-ray source for microlithography

Journal of X-Ray Science and Technology

Volumn 3, Issue 2, 1992, Pages 133-151

  Tallents, Greg J ^b   Batani, Dimitri ^b   van der Wiel, Marnix J ^a   Turcu, Edmond C I ^a  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000524068     PISSN: 08953996     EISSN: None     Source Type: Journal    
DOI: 10.3233/XST-1992-3205     Document Type: Article

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