Investigation of the W–TiN metal gate for metal–oxide–semiconductor devices

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1591-1594

  Youn, Sunpil ^a   Roh, Kwanchong ^a   Yang, Sungwoo ^a   Roh, Yonghan ^a   Kim, ki su ^a   Jang, Young Chul ^a   Lee, Nae Eung ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

TiN; W

Indexed keywords

EID: 0013286720     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.1345913     Document Type: Conference Paper

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