Sheet resistance modeling of the Ti/SiO2 system upon high temperature annealing

Applied Physics Letters

Volumn 76, Issue 1, 2000, Pages 64-66

  Zeng, Yuxiao ^a,b   Chen, Linghui ^a   Alford, T L ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

^b Epitronics Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042730711     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125657     Document Type: Article

References (10)

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