Selective fabrication of InGaN nanostructures by the focused ion beam/metalorganic chemical vapor deposition process

Journal of Applied Physics

Volumn 87, Issue 3, 2000, Pages 1374-1378

  Lachab, M ^a   Nozaki, M ^a   Wang, J ^a   Ishikawa, Y ^a   Fareed, Q ^a   Wang, T ^a   Nishikawa, T ^a   Nishino, K ^a   Sakai, S ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012408054     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372023     Document Type: Article

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