Mechanical lithography using a single point diamond machining

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1439-1445

  Goss, S H ^a   Grazulis, L ^a   Tomich, D H ^a   Eyink, K G ^a   Walck, S D ^a   Haas, T W ^a   Thomas, D R ^a   Lampert, W V ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011493947     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589962     Document Type: Article

References (26)

1. L. W. Guo, H. Chen, J. M. Zhou, and Q. Huang, J. Cryst. Growth 153, 110 (1995).
2. S. Koshiba, H. Noge, H. K. Ichinose, H. Akiyama, Y. Nakamura, T. Insohita, T. Someya, K. Wada, A. Shimizu, and H. Sakaki, Solid-State Electron. 37, 729 (1994).
3. R. P. Mirin, I. Tan, H. Weman, M. Leonard, T. Yasuda, J. E. Bowers, and E. L. Hu, J. Vac. Sci. Technol. 10, 697 (1992).
4. D. J. Arent, S. Nilsson, Y. D. Galeuchet, H. P. Meier, and W. Walter, Appl. Phys. Lett. 55, 2611 (1989).
5. T. W. Wu, J. Mater. Res. 6, 407 (1991).
6. B. Bhushan and X. Li, J. Mater. Res. 12, 54 (1997).
7. S. V. Hainsworth, H. W. Chandler, and T. F. Page, J. Mater. Res. 11, 1987 (1996).
8. A. B. Mann, J. B. Pethica, W. D. Nix, and S. Tomiya, Mater. Res. Soc. Symp. Proc. 356, 271 (1995).
9. R. R. Kunz, H. R. Clark, P. M. Nitishin, M. Rothschild, and B. S. Ahem, J. Mater. Res. 11, 1228 (1996).
10. E. J. van Loenen, D. Dijkkamp, A. J. Hoeven, J. M. Lenssinck, and J. Dieleman, J. Vac. Sci. Technol. A 8, 574 (1990).
11. J. A. Dagata, J. Schneir, H. H. Harary, J. Bennett, and W. Tseng, J. Vac. Sci. Technol. B 9, 1384 (1991).
12. E. S. Snow, P. M. Campbell, and P. J. McMarr, Appl. Phys. Lett. 63, 749 (1993).
13. R. Magno and B. R. Bennett, Appl. Phys. Lett. 70, 1855 (1997).
14. S. D. Walck and J. P. McAaffrey, Specimen Preparation for Transmission Electron Microscopy of Materials IV, edited by R. M. Anderson and S. D. Walck (The Materials Research Society Proceedings, Pittsburgh, PA, 1997), Vol. 480.
15. Hystron Inc., 2010 East Hennepin Ave., Minneapolis, MN 55413.
16. RHK Technology Inc., 1750 W, Hamiln Rd., Rochester Hill, MI 48309.
17. Omicron Associates, 1738 N. Highland Rd., Suite G101, Pittsburgh, PA 15241.
18. Digital Instruments, 520 East Montecito St., Santa Barbara, CA 93103.
19. V. S. Wang and R. J. Matyi, J. Electron. Mater. 21, 23 (1992).
20. G. F. Feng and R. Zallen, Phys. Rev. B 40, 1064 (1989).
21. E. T. Lilleodden, W. Bonin, J. Nelson, I. T. Wyrobek, and W. W. Gerberich, J. Mater. Res. 10, 2162 (1995).
22. A. B. Mann and J. B. Pethica, Appl. Phys. Lett. 69, 907 (1996).
23. R. Sherman and W. Whitlock, J. Vac. Sci. Technol. B 8, 563 (1990).
24. E. J. Petit and F. Houzay, J. Vac. Sci, Technol, B 12, 547 (1994).
25. T. M. Burke, M. A. Quierin, M. P. Grimshaw, D. A. Ritchie, M. Pepper, and J. H. Burroughes, J. Vac. Sci. Technol. B 15, 325 (1997).
26. Y. Morishita, Y. Norura, S. Goto, M. Yamada, and Y. Katayama, Jpn. J. Appl. Phys., Part 2 34, L397 (1995).