Thermocurable polymers as resists for imprint lithography

Electronics Letters

Volumn 36, Issue 11, 2000, Pages 983-984

  Tormen, M ^a   Borzenko, T ^a   Schmidt, G ^a   Liu, J ^a   Molenkamp, L W ^a  

^a UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011422273     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20000708     Document Type: Article

References (5)

1. CHOU, S.Y., KRAUSS, P.R., and RENSTROM, P.J.: 'Imprint lithography with 25-nanometer resolution', Sci., 1996, 272, pp. 85-87
2. CHOU, S.Y., KRAUSS, P.R., WEI ZHANG, LINGUE GOU, and LEI ZHUANG: 'Sub-10nm imprint lithography and applications', J. Vac. Sci. Technol. B, 1997, 15, (6), pp. 2897-2904
3. XIA, Y., and WHITESIDES, G.M.: 'Soft lithography', Angew. Chem., Int. Ed. Engl., 1998, 37, pp. 550-575
4. SCHMIDT, G., TORMEN, M., MÜLLER, G., MOLENKAMP, L.W., CHEN, Y., LEBIB, A., and LAUNOIS, H.: 'Versatile patterning for semiconductor based on microcontact printing', Electron. Lett., 1999, 35, (20), pp. 1731-1733
5. KUMAR, A., and WHITESIDES, G.M.: 'Features of gold having micrometer to centimeter dimensions can be formed through a combination of stamping with an elastomeric stamp and an alkanethiol 'ink' followed by chemical etching', Appl. Phys. Lett., 1993, 63, pp. 2002-2004