CD control for quarter micron logic device gates using iso-pitch bias

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 629-639

  Kim, Young Chang ^a   Yeo, Gisung ^a   Shin, Hye Soo ^a   Kim, Hak ^a   Kang, Hoyoung ^a   Chung, U In ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Iso dense bias; Iso pitch bias; On chip line width variation; Optical proximity effect

Indexed keywords

PROCESS CONTROL; THICKNESS MEASUREMENT;

CROSS DIRECTIONAL (CD) CONTROL; CROSS MACHINE DIRECTION (CD) VARIATION; DEVICE GATE; ISO-DENSE BIAS; ISO-PITCH BIAS; ON CHIP LINE WIDTH VARIATION; OPTICAL PROXIMITY EFFECT; PROCESS CONDITIONS; PROCESS OPTIMIZATION; PROXIMITY EFFECTS;

LOGIC DEVICES;

EID: 0010895431     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310793     Document Type: Conference Paper

References (7)

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7. Ki-Yeop Park et al., "Process Optimization by Reducing I-D Bias for 0.25 μ m Logic Devices", SPIE Vol. 3051, pp. 170, 1997