Performance of sr lithography in giga-bit dram fabrication

Journal of Photopolymer Science and Technology

Volumn 9, Issue 4, 1996, Pages 637-644

  Watanabe, Hiroshi ^a   Sumitani, Hiroaki ^a   Itoga, Kenji ^a   Hifumi, Takashi ^a   Inoue, Masami ^a   Marumoto, Kenji ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010365327     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.9.637     Document Type: Article

References (9)

1. A. Imai, N. Asai, T. Ueno, N. Hasegawa, T. Tanaka, T. Terasawa and S. Okazaki, Jpn. J.Appl. Phys., 33 (1994) 6816.
2. K. Marumoto, H. Yabe, S. Aya, K. Kise and Y. Matsui, SPIE 2194(1994)221.
3. T. Hifumi and T. Itoh, SPIE 2437 (1995) 151.
4. H. Sumitani, K. Itoga, M. Inoue, H. Watanabe, N. Yamamoto, K. Marumoto and Y. Matsui, SPffi 2437 (1995) 94.
5. K. Deguchi, K. Miyoshi, H. Ban, H. Kyuragi, S. Konaka and T. Matsuda, J. Vac. Sci.Technol. B 10, 6 (1992) 3145.
6. R. Viswanathan, D. Seeger, A. Bright, T. Bucelot, A. Pomerene, K. Petrillo, P. Blauner, P. Agnello, J. Warlaumont, J. Conway and D. Patel, J. Vac. Sei. Technol. B 11, 6 (1993) 2910.
7. K..Fujii, S. Tsuboi, T. Yoshihara, Y. Tanaka, K. Suzuki, S. Setoguchi and T. Miyatake, J.Vac. Sei. Technol. B 11, 6 (1993) 2897.
8. R. DellaGuardia, C. Wasik, D. Puisto, R. Fair, L. Liebman, J. Rocque, S. Nash, A. Lamberti, G. Collini, R. French, B. Vampatella, G. Gifford, V. Nastasi, P. Sa, F. Volkringer, T.Zell, D. Seeger and J. Warlaumont, SPIE 2437 (1995) 112.
9. H. Sumitani, K. Itoga, H. Shimano, S. Aya, H. Yabe, T. Hifumi, H. Watanabe, K. Kise, M. Inoue, K. Marumoto,Y.Nishioka, H. Abe, N. Mizusawa, K.Saitoh, Y.Fukuda and S. Uzawa, to be published (SPIE 1996). '