Total evaluation of W-Ti absorber for x-ray mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2194, Issue , 1994, Pages 221-230

  Marumoto, Kenji ^a   Yabe, Hideki ^a   Aya, Sunao ^a   Kise, Koji ^a   Matsui, Yasuji ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; ELECTRON CYCLOTRON RESONANCE; INTEGRATED CIRCUIT MANUFACTURE; METALLIC FILMS; MICROSTRUCTURE; PLASMA ETCHING; PLASMAS; TITANIUM; TUNGSTEN; X RAY LITHOGRAPHY;

ANISOTROPIC ETCHING; ITO STOPPER; MICROFABRICATION; TUNGSTEN TITANIUM FILMS; ULTRA LOW STRESS FILMS; X RAY MASK ABSORBERS;

PHOTORESISTS;

EID: 0028751159     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.175808     Document Type: Conference Paper

References (16)