Replicating characteristics by SR lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2437, Issue , 1995, Pages 94-103

  Sumitani, Hiroaki ^a   Itoga, Kenji ^a   Inoue, Masami ^a   Watanabe, Hiroshi ^a   Yamamoto, Norikazu ^a   Marumoto, Kenji ^a   Matsui, Yasuji ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; ELECTRONIC PROPERTIES; IMAGING TECHNIQUES; MASKS; PHASE SHIFT; SILICON NITRIDE; SYNCHROTRON RADIATION;

FRESNEL DIFFRACTION; PATTERN REPLICATION; SECONDARY ELECTRONS;

X RAY LITHOGRAPHY;

EID: 0029226588     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.209188     Document Type: Conference Paper

References (19)