Quantitative evaluation of in-plane deformation due to mask holding in x-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2437, Issue , 1995, Pages 151-157

  Hifumi, Takashi ^a   Itoh, Tohru ^a  

^a Jpn ^*

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; EVALUATION; INTEGRATED CIRCUIT MANUFACTURE; MASKS; NUMERICAL ANALYSIS; THERMAL EFFECTS;

PATTERN REPLICATION; TOOL-HOLDING DEFORMATION;

X RAY LITHOGRAPHY;

EID: 0029224347     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.209155     Document Type: Conference Paper

References (5)