Fabrication of 64-Mb DRAM using x-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2437, Issue , 1995, Pages 112-125

  Dellaguardia, Ron ^a   Wasik, C ^a   Puisto, Denise ^a   Fair, R ^a   Liebmann, Lars W ^a   Rocque, Janet M ^a   Nash, Steven C ^a   Lamberti, Angela C ^a   Collini, George J ^a   French, R ^a   Vampatella, Ben R ^a   Gifford, George G ^a   Nastasi, V ^a   Sa, P ^a   et al, ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNMENT; CONTROL SYSTEMS; DEFECTS; FABRICATION; INTEGRATED CIRCUIT MANUFACTURE; MASKS; PERFORMANCE; RANDOM ACCESS STORAGE; STORAGE RINGS;

DRAM; HELIOS SUPERCONDUCTING STORAGE RING;

X RAY LITHOGRAPHY;

EID: 0029215168     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)