Reduction of internal stress in sputter-deposited films by energetic ion bombardment

Applied Physics Letters

Volumn , Issue , 1995, Pages 3743-

  Nowak, R ^a   Horino, Y ^a,b   Ando, Y ^a   Maruno, S ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

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EID: 36449001302     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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