Investigation of particle formation during the plasma enhanced chemical vapor deposition of amorphous silicon, oxide, and nitride films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 2, 1998, Pages 483-489

  Rao, N P ^a,b   Wu, Z ^a,b   Nijhawan, S ^a,b   Ziemann, P ^a,b   Campbell, S ^a,b   Kittelson, D B ^a,b   McMurry, P ^a,b  

^a UNIVERSITY OF MINNESOTA   (United States)

^b Department of Mechanical Engineering ^*

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008514909     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589851     Document Type: Article

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