Nonequilibrium plasmas for material processing in microelectronics

Materials Science Forum

Volumn 282-283, Issue , 1998, Pages 47-56

  Petrovic, Z Lj ^a,b   Makabe, T ^b  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b KEIO UNIVERSITY   (Japan)

Author keywords

Capacitively Coupled Plasma; Inductively Coupled Plasma; Ionization; Plasma Chemistry; Plasma Deposition; Plasma Etching; Rf Discharges; Thin Films

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; MICROELECTRONIC PROCESSING; PLASMA ETCHING; REACTIVE ION ETCHING; ULSI CIRCUITS;

CAPACITIVELY COUPLED PLASMAS (CCP); INDUCTIVELY COUPLED PLASMAS (ICP); NONEQUILIBRIUM PLASMAS;

PLASMA APPLICATIONS;

EID: 0007364076     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.282-283.47     Document Type: Article

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