-
1
-
-
0024752976
-
-
S. S. Iyer, G. L. Patton, J. M. C. Stork, B. S. Meyerson, and D. L. Harame, IEEE Trans. Electron Devices ED-36, 2043 (1989).
-
(1989)
IEEE Trans. Electron Devices
, vol.ED-36
, pp. 2043
-
-
Iyer, S.S.1
Patton, G.L.2
Stork, J.M.C.3
Meyerson, B.S.4
Harame, D.L.5
-
2
-
-
0022687784
-
-
H. Daembkes, H.-J. Herzog, H. Jorke, H. Kibbel, and E. Kasper, IEEE Trans. Electron Devices ED-33, 633 (1986).
-
(1986)
IEEE Trans. Electron Devices
, vol.ED-33
, pp. 633
-
-
Daembkes, H.1
Herzog, H.-J.2
Jorke, H.3
Kibbel, H.4
Kasper, E.5
-
5
-
-
21544461833
-
-
M. Lambsdorff, J. Khol, J. Rosenzweig, A. Axmann, and J. Schneider, Appl. Phys. Lett. 58, 1881 (1991).
-
(1991)
Appl. Phys. Lett.
, vol.58
, pp. 1881
-
-
Lambsdorff, M.1
Khol, J.2
Rosenzweig, J.3
Axmann, A.4
Schneider, J.5
-
6
-
-
36448999017
-
-
V. M. Rao, W. P. Hong, C. Caneau, G. K. Chang, N. Papanicolaou, and H. B. Dietrich, J. Appl. Phys. 70, 3943 (1991).
-
(1991)
J. Appl. Phys.
, vol.70
, pp. 3943
-
-
Rao, V.M.1
Hong, W.P.2
Caneau, C.3
Chang, G.K.4
Papanicolaou, N.5
Dietrich, H.B.6
-
8
-
-
0006777202
-
-
J. J. Goubet, D. Stievenard, D. Mathiot, and M. Zazoui, Phys. Rev. B 46, 10113 (1992).
-
(1992)
Phys. Rev. B
, vol.46
, pp. 10113
-
-
Goubet, J.J.1
Stievenard, D.2
Mathiot, D.3
Zazoui, M.4
-
11
-
-
0032473270
-
-
M. Mamor, F. D. Auret, S. A. Goodman, and G. Myburg, Appl. Phys. Lett. 72, 1069 (1998).
-
(1998)
Appl. Phys. Lett.
, vol.72
, pp. 1069
-
-
Mamor, M.1
Auret, F.D.2
Goodman, S.A.3
Myburg, G.4
-
12
-
-
0006774941
-
-
S. A. Goodman, F. D. Auret, K. Nauka, and J. B. Malherbe, J. Electron. Mater. 26, 463 (1997).
-
(1997)
J. Electron. Mater.
, vol.26
, pp. 463
-
-
Goodman, S.A.1
Auret, F.D.2
Nauka, K.3
Malherbe, J.B.4
-
17
-
-
0037808786
-
-
C. V. Budtz-Jørgensen, P. Kringhøj, A. N. Larsen, and N. V. Abrosimov, Phys. Rev. B 58, 1110 (1998).
-
(1998)
Phys. Rev. B
, vol.58
, pp. 1110
-
-
Budtz-Jørgensen, C.V.1
Kringhøj, P.2
Larsen, A.N.3
Abrosimov, N.V.4
-
18
-
-
36449004545
-
-
E. Simoen, G. Bosman, J. Vanhellemont, and C. Claeys, Appl. Phys. Lett. 66, 2507 (1995).
-
(1995)
Appl. Phys. Lett.
, vol.66
, pp. 2507
-
-
Simoen, E.1
Bosman, G.2
Vanhellemont, J.3
Claeys, C.4
-
21
-
-
0000479826
-
-
H. Ouacha, M. Mamor, M. Willander, A. Ouacha, and F. D. Auret, J. Appl. Phys. 87, 3858 (2000).
-
(2000)
J. Appl. Phys.
, vol.87
, pp. 3858
-
-
Ouacha, H.1
Mamor, M.2
Willander, M.3
Ouacha, A.4
Auret, F.D.5
-
22
-
-
0029639485
-
-
J. P. Dubuc, E. Simoen, P. Vasina, and C. Claeys, Electron 31, 1016 (1995).
-
(1995)
Electron
, vol.31
, pp. 1016
-
-
Dubuc, J.P.1
Simoen, E.2
Vasina, P.3
Claeys, C.4
-
23
-
-
0042424234
-
-
edited by M. Nakamura, T. Dao, and T. Hook Sunnyvale, CA
-
V. Ramgopal Rao, G. Wijeratne, D. Chu, T. Brozek, and G. R. Viswanathan, in Proceedings of the 3rd International Symposium on Plasma Process-Induced Damage, edited by M. Nakamura, T. Dao, and T. Hook (Sunnyvale, CA, 1998), p. 124.
-
(1998)
Proceedings of the 3rd International Symposium on Plasma Process-induced Damage
, pp. 124
-
-
Ramgopal Rao, V.1
Wijeratne, G.2
Chu, D.3
Brozek, T.4
Viswanathan, G.R.5
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