Generation and annealing kinetics of current induced metastable defects in amorphous silicon alloys

Journal of Non-Crystalline Solids

Volumn 266-269 A, Issue , 2000, Pages 432-436

  Lau, S P ^a   Shannon, J M ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006342090     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00771-1     Document Type: Article

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