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Volumn 41, Issue 10, 1998, Pages 101-110

Spectroscopic ellipsometry for polymer thin films

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0005819748     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article
Times cited : (29)

References (14)
  • 1
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    • Spectroscopic Ellipsometry for Process Applications
    • Oct.
    • J.N. Hilfiker, R.A. Synowicki, "Spectroscopic Ellipsometry for Process Applications," Solid State Technology, p. 157, Oct. 1996.
    • (1996) Solid State Technology , pp. 157
    • Hilfiker, J.N.1    Synowicki, R.A.2
  • 3
    • 1342318416 scopus 로고    scopus 로고
    • 1-xCdxTe for Control of Composition by Spectroscopic Ellipsometry during MBE Growth
    • 1-xCdxTe for Control of Composition by Spectroscopic Ellipsometry During MBE Growth," Thin Solid Films, pp. 313-314, 137, 1998.
    • (1998) Thin Solid Films , pp. 313-314
    • Johs, B.1
  • 4
    • 0000303554 scopus 로고    scopus 로고
    • Optical Determination of Shallow Carrier Profiles Using Fourier Transform Infrared Ellipsometry
    • T.E. Tiwald, D.W. Thompson, J.A. Woollam, "Optical Determination of Shallow Carrier Profiles Using Fourier Transform Infrared Ellipsometry," J. Vac. Sci. Technol. B, 16 (1), 312, 1998.
    • (1998) J. Vac. Sci. Technol. B , vol.16 , Issue.1 , pp. 312
    • Tiwald, T.E.1    Thompson, D.W.2    Woollam, J.A.3
  • 5
    • 0031998221 scopus 로고    scopus 로고
    • Application of IR Variable Angle Spectroscopic Ellipsometry to the Determination of Free Carrier Concentration Depth Profiles
    • T.E. Tiwald, et al., "Application of IR Variable Angle Spectroscopic Ellipsometry to the Determination of Free Carrier Concentration Depth Profiles," Thin Solid Films, pp. 313-314, 661, 1998.
    • (1998) Thin Solid Films , pp. 313-314
    • Tiwald, T.E.1
  • 6
    • 0010318703 scopus 로고    scopus 로고
    • Employing Spectroscopic Ellipsometry for Lithography Applications
    • J.N. Hilfiker, R.A. Synowicki, "Employing Spectroscopic Ellipsometry for Lithography Applications," Semiconductor Fabtech, 5th Ed., p. 189, 1997.
    • (1997) Semiconductor Fabtech, 5th Ed. , pp. 189
    • Hilfiker, J.N.1    Synowicki, R.A.2
  • 7
    • 0032402412 scopus 로고    scopus 로고
    • Refractive Index Measurements of Photoresist and Antireflective Coatings with Variable Angle Spectroscopic Ellipsometry
    • R.A. Synowicki, J.N. Hilfiker, R.R. Dammel, C.L Henderson, "Refractive Index Measurements of Photoresist and Antireflective Coatings with Variable Angle Spectroscopic Ellipsometry," SPIE Proc. Vol. 3332, p. 384, 1998.
    • (1998) SPIE Proc. , vol.3332 , pp. 384
    • Synowicki, R.A.1    Hilfiker, J.N.2    Dammel, R.R.3    Henderson, C.L.4
  • 8
    • 0000980338 scopus 로고    scopus 로고
    • Bleaching-Induced Changes in the Dispersion Curves of DNQ Photoresists
    • C.L. Henderson, C.G. Willson, R.R. Dammel, R.A. Synowicki, "Bleaching-Induced Changes in the Dispersion Curves of DNQ Photoresists," SPIE Proc. Vol. 3049, p. 585, 1997.
    • (1997) SPIE Proc. , vol.3049 , pp. 585
    • Henderson, C.L.1    Willson, C.G.2    Dammel, R.R.3    Synowicki, R.A.4
  • 9
    • 58649121965 scopus 로고    scopus 로고
    • A Study of the Modifications of Polymeric ARC Films by UV Irradiation
    • to be published
    • R. A. Carpio, A. Stephen, J. Eisele, "A Study of the Modifications of Polymeric ARC Films by UV Irradiation," SPIE, 1998 (to be published).
    • (1998) SPIE
    • Carpio, R.A.1    Stephen, A.2    Eisele, J.3
  • 10
    • 0013413425 scopus 로고    scopus 로고
    • S. Kishimura, et al., SPIE Vol. 3049, p. 944.
    • SPIE , vol.3049 , pp. 944
    • Kishimura, S.1
  • 11
    • 0009397880 scopus 로고    scopus 로고
    • Dependence of Optical Constants of AZ BarLi Bottom Coating on Bake Conditions
    • R.R. Dammel, J. Sagan, R.A. Synowicki, "Dependence of Optical Constants of AZ BarLi Bottom Coating on Bake Conditions," SPIE Proc., Vol. 3049, p. 963, 1997.
    • (1997) SPIE Proc. , vol.3049 , pp. 963
    • Dammel, R.R.1    Sagan, J.2    Synowicki, R.A.3
  • 12
    • 0032096614 scopus 로고    scopus 로고
    • Dielectric Anisotropy in CVD Polymer Thin Films
    • J.J. Senkevich, S.B. Desu, "Dielectric Anisotropy in CVD Polymer Thin Films," Semi. Intl., Vol. 21, No. 6, p. 151, 1998.
    • (1998) Semi. Intl. , vol.21 , Issue.6 , pp. 151
    • Senkevich, J.J.1    Desu, S.B.2
  • 13
    • 0000739985 scopus 로고    scopus 로고
    • N. Aoi, Jpn. J. Appl. Phys., Vol. 36, pp. 1355-1359, Part 1, No. 3B, 1997.
    • (1997) Jpn. J. Appl. Phys. , vol.36 , Issue.1-3 PART AND B , pp. 1355-1359
    • Aoi, N.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.