Refractive index measurements of photoresist and antireflective coatings with variable angle spectroscopic ellipsometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 384-390

  Synowicki, Ron A ^a   Hilfiker, James N ^a   Dammel, Ralph R ^a   Henderson, Clifford L ^a  

^a J A WOOLLAM CO INC   (United States)

Author keywords

Antireflective Coatings; Optical Constants; Optical Data Analysis; Photoresists; Refractive Index; Spectroscopic Ellipsometry; VASE

Indexed keywords

ANTIREFLECTION COATINGS; ELLIPSOMETRY; OPTICAL DATA PROCESSING; REFRACTIVE INDEX; SPECTROSCOPIC ANALYSIS; THIN FILMS; ULTRAVIOLET RADIATION;

OPTICAL CONSTANTS;

PHOTORESISTS;

EID: 0032402412     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308747     Document Type: Conference Paper

References (11)

1. Bleaching-induced changes in the dispersion curves of DNQ photoresists
2. Dependence of optical constants of AZ® BARLi bottom coating on bake conditions
3. The accurate determination of optical properties by ellipsometry
4. Variable Angle Spectroscopic Ellipsometry, VASE
5. Spectroscopic ellipsometry for process applications
6. Employing Spectroscopic ellipsometry for lithography applications
7. Multiwavelength ellipsometry fathoms materials