Stability of optical interference coatings exposed to low-fluence 193nm ArF radiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 1041-1047

  Heber, Joerg ^a   Thielsch, Roland ^a   Blaschke, Holger ^a   Kaiser, Norbert ^a   Mann, Klaus R ^b   Eva, Eric ^b   Leinhos, Uwe ^c   Görtler, Andreas ^c  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b LASER LABORATORIUM GÖTTINGEN E V   (Germany)

^c Lambda Physik GmbH   (Germany)

Author keywords

Dielectric coatings; Optical properties; UV radiation degradation

Indexed keywords

ABSORPTION; ARGON; CALCIUM; CALCIUM FLUORIDE; COATINGS; DEGRADATION; FUSED SILICA; INERT GASES; IRRADIATION; LASER DAMAGE; LASERS; OPTICAL COATINGS; OPTICAL PROPERTIES; OPTICAL SYSTEMS; RADIATION; RESEARCH REACTORS; SILICA; SURFACE PROPERTIES;

193 NM LASER; ABSORPTION LEVELS; ANTI-REFLECTIVE (AR) COATINGS; ARGON ATMOSPHERES; COATING MATERIALS; DAMAGE THRESHOLDS; DIELECTRIC COATINGS; DIELECTRIC MIRRORS; EVAPORATION PROCESS; FLUENCE; FLUORIDE COATINGS; INTERFERENCE COATINGS; IRRADIATION CONDITIONS; IRRADIATION EXPERIMENTS; LASER IRRADIATIONS; LOW LOSSES; MULTI LAYER COATINGS; OXIDE LAYERS; OXIDE MATERIALS; RADIATION CONDITIONS; RADIATION-RESISTANCE; SUBSTRATE PROPERTIES; UPPER LIMITS; UV-RADIATION DEGRADATION;

REFLECTIVE COATINGS;

EID: 0005294466     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310734     Document Type: Conference Paper

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