UV and gas interactions in an enclosed 193nm excimer laser beamline

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2992, Issue , 1997, Pages 51-63

  Elliott, David J ^a   Camp, Jonathan C ^a   Harlow, Warren C ^a   Dosoretz, Victor ^b   Behr, Daniel ^b   Callahan, Glen P ^c   Flint, Scott ^c  

^a Excimer Laser Systems   (United States)

^b Gillette Advanced Technology Center USA   (United States)

^c Acton Research Corporation   (United States)

Author keywords

193nm excimer laser; Inert gas; Joulemeter uv absorption; Ozone; Pulse energy

Indexed keywords

ENERGY EFFICIENCY; EXCIMER LASERS; INERT GASES; LASER BEAMS; OPTICAL SYSTEMS; OZONE;

ENERGY EFFICIENT; ENERGY TRANSMISSION; LASER BEAM DELIVERY; LASER-PULSE ENERGY; OZONE CONCENTRATION; POSITIVE PRESSURE; PULSE ENERGIES; UV ABSORPTION;

LASER MIRRORS;

EID: 58649085099     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.270099     Document Type: Conference Paper

References (5)

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2. C. R. Szmanda, G. N. Taylor, "A new negative resist for 193nm imaging", 1st Intl. Symposium on 193nm Lithography, August 15-18, 1995, Colorado Springs, Colorado.
3. M. Rothschild, J. H. C. Sedlacek, R. Uttaro, and M. Fritze, R. Schenker, W. G. Oldham, D. Corliss, "Laser Induced Damage in Optical Materials", 2nd Intl. Symposium on 193nm Lithography, July 30-August 2, 1996, Colorado Springs, Colorado.
4. U. Stamm, J. Kleinschmidt, P. Heist, R. Patzel, I. Bragin, D. Basting, "Narrow Linewidth ArF Excimer Laser for DUV Lithography", Proceedings, 2nd Intl. Symposium on 193nm Lithography, July 30-August 2, 1996, Colorado Springs, Colorado.
5. R. Sandstrom, "Progress on the development of a 5pm line-narrowed 193nm ArF excimer laser for microlithography", 2nd Intl. Symposium on 193nm Lithography, July 30-August 2, 1996, Colorado Springs, Colorado.