193-nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2703, Issue , 1996, Pages 398-404

  Rothschild, Mordechai ^a   Forte, Anthony R ^a   Horn, Mark W ^a   Kunz, Roderick R ^a   Palmateer, Susan C ^a   Sedlacek, Jan H C ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Excimer; Lithography; Optical materials; Photo resists; Projection optics; Silylation

Indexed keywords

ARGON; EXCIMER LASERS; GAS LASERS; INERT GASES; LASERS; MICROELECTRONICS; OPTICAL MATERIALS; PHOTORESISTORS; PROJECTION SYSTEMS; SILANES; THICKNESS MEASUREMENT;

ARGON FLUORIDES; CURRENT STATUSES; EARLY STAGES; EXCIMER; PHOTO RESISTS; PROJECTION OPTICS; SILYLATION;

LITHOGRAPHY;

EID: 0013224408     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.237751     Document Type: Conference Paper

References (19)

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