Lithographic process simulation for scanners

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 164-175

  Erdmann, Andreas ^a   Arnz, Michael ^b   Maenhoudt, Mireille ^c   Baselmans, Jan ^d   Van Osnabrugge, Jan Chris ^d  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^b CARL ZEISS SMT AG   (Germany)

^c IMEC   (Belgium)

^d ASM Lithograpy ^*  (Netherlands)

Author keywords

Aberration averaging; Lithography simulation; Step and scan

Indexed keywords

ABERRATIONS; LITHOGRAPHY;

ABERRATION AVERAGING; IMAGE FIELDS; LATERAL SHIFTING; LITHOGRAPHIC PROCESSING; LITHOGRAPHY SIMULATION; PROJECTION OPTICS (PO); SCANNER SYSTEMS; STEP AND SCAN;

SCANNING;

EID: 0003121564     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310746     Document Type: Conference Paper

References (9)

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