The impact of aberration averaging during step-and-scan on the photolithographic process

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 117-120

  Erdmann, A ^a   Arnz, M ^b  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; OPTICS; POLYNOMIALS;

AVERAGING EFFECT; STEP-AND-SCAN;

LITHOGRAPHY;

EID: 12844252170     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00025-2     Document Type: Article

References (4)

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2. Bischoff, W.Henke, J. van den Werf and P. Dirksen, Proc. SPIE 2197 (1994) 953
3. J.Braat and P.Rennspies, Applied Optics 35 (1996) 690
4. D.G.Flagello, J.de Klerk, R.Rogoff, G.Davies, B.Geh, U.Wegman, M.Kramer and M.Arnz, Proc. SPIE 3051 (1997) 672