Simulations on step & scan optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2197, Issue , 1994, Pages 953-964

  Bischoff, Jorg ^a   Henke, Wolfgang ^a   Werf, Jan V D ^b   Dirksen, Peter ^b  

^a FhG Institut für Siliziumtechnologie ^*  (Germany)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ECONOMIC AND SOCIAL EFFECTS; OPTICAL INSTRUMENTS; PHOTOLITHOGRAPHY; PRINTING PRESSES;

CONSTANT VELOCITIES; CONTRAST TRANSFER; DISTURBANCE AMPLITUDES; EVALUATION CRITERIA; IMAGE DEGRADATION; QUANTITATIVE VALUES; STEP-AND-REPEAT; SYNCHRONIZATION ERROR;

VIBRATIONS (MECHANICAL);

EID: 0000315221     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.175488     Document Type: Conference Paper

References (10)

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