Epitaxial PZT thin films on TiOx covered Pt/MgO substrate by RF magnetron sputtering

Ferroelectrics

Volumn 256, Issue 1, 2001, Pages 47-68

  Bouregba, R ^a   Poullain, G ^a   Vilquin, B ^a   Murray, H ^a  

^a UNIVERSITÉ DE CAEN   (France)

Author keywords

Epitaxy; polarization AIP's PACS; PZT; sputtering; thin films; X ray diffraction

Indexed keywords

C-AXIS ORIENTATIONS; EPITAXIAL FERROELECTRIC; EPITAXIAL PZT; EPITAXY; HIGH-CRYSTALLINE QUALITY; IN-SITU CRYSTALLIZATION; PEROVSKITE PHASE; PLASMA GAS; PREFERRED ORIENTATIONS; PT DEPOSITION; PT ELECTRODE; PZT; PZT DEPOSITION; RF-MAGNETRON SPUTTERING; TEXTURED MICROSTRUCTURE; TIO; ULTRA-THIN; UPPER LAYER;

CRYSTAL STRUCTURE; CRYSTALLIZATION; DIFFRACTION; EPITAXIAL GROWTH; FERROELECTRIC FILMS; HYSTERESIS; LEAD; MAGNETRON SPUTTERING; MICROSTRUCTURE; OXYGEN; OXYGEN VACANCIES; PEROVSKITE; PLATINUM; POLARIZATION; SINGLE CRYSTALS; VAPOR DEPOSITION; X RAY DIFFRACTION;

EPITAXIAL FILMS;

EID: 0002702306     PISSN: 00150193     EISSN: 15635112     Source Type: Journal    
DOI: 10.1080/00150190108015973     Document Type: Article

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