Wet chemical etch solutions for AlxGa1-xP

Journal of the Electrochemical Society

Volumn 143, Issue 1, 1996, Pages

  Lee, J W ^a   Santana, C J ^a   Abernathy, C R ^a   Pearton, S J ^a   Ren, F ^b  

^a J Crayton Pruitt Family Department of Biomedical Engineering   (United States)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ETCHING; HETEROJUNCTIONS; HYDROCHLORIC ACID; HYDROFLUORIC ACID; METHANOL; MOLECULAR BEAM EPITAXY; PHOSPHORIC ACID; POTASSIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING SILICON;

ALUMINUM GALLIUM PHOSPHIDE; HYPHOSPHORUS ACID; METALLORGANIC MOLECULAR BEAM EPITAXY; POTASSIUM HYDROXIDE; WET CHEMICAL ETCH SOLUTIONS; WET ETCHING;

SOLUTIONS;

EID: 0029771231     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836371     Document Type: Article

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