Evaluation of correction parameters for elastic-scattering effects in x-ray photoelectron spectroscopy and Auger electron spectroscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 4, 1997, Pages 2095-2106

  Jablonski, A ^a   Powell, C J ^b  

^a INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CALCULATIONS; ELECTRON SCATTERING; ELECTRONS; ERROR CORRECTION; ESTIMATION; INSTRUMENT ERRORS; POLYCRYSTALLINE MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELASTIC ELECTRON SCATTERING EFFECTS; MEAN ESCAPE DEPTH; SYSTEMATIC ERROR;

MATHEMATICAL MODELS;

EID: 0031189035     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580615     Document Type: Review

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