Optimization of lithography and CD control using GHOST proximity correction with a MEBES® 4500 system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2884, Issue , 1996, Pages 302-310

  Dean, Robert L ^a  

^a Etec Systems Inc   (United States)

Author keywords

CD control; CD linearity; CD uniformity; GHOST; MEBES 4500; Proximity effect correction; Raster scan

Indexed keywords

LINEARIZATION; PHOTORESISTS;

CD CONTROL; CD LINEARITY; CD UNIFORMITY; GHOST; MEBES 4500; PROXIMITY EFFECT CORRECTION; RASTER SCAN;

DATA STORAGE EQUIPMENT;

EID: 57949113725     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.262812     Document Type: Conference Paper

References (0)