Reduction of mask-error effect utilizing pupil filter in alternative phase-shift lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 77-84

  Nakao, Shuji ^a   Nakae, Akihiro ^a   Tsujita, Kouichirou ^a   Matsui, Yasuji ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; ERROR ANALYSIS; MASKS; NUMERICAL ANALYSIS; PHASE SHIFT;

OPTICAL MICROLITHOGRAPHY; RESOLUTION ENHANCEMENT;

PHOTOLITHOGRAPHY;

EID: 0031354050     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.276004     Document Type: Conference Paper

References (4)