Two-dimensional transport of submicron particles in capacitively coupled plasma reactor

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 6 A, 1997, Pages 3707-3713

  Hashido, Ryu Ichi ^a   Hasebe, Masao ^a   Hosokawa, Yoshiyuki ^b   Nakano, Nobuhiko ^a   Yamaguchi, Yukio ^c   Makabe, Toshiaki ^a  

^a KEIO UNIVERSITY   (Japan)

^b KOBE STEEL LTD   (Japan)

^c MITSUBISHI CHEMICAL CORPORATION   (Japan)

Author keywords

2D particle transport; Gas flow; Particle trapping; Particle free process; RCT model; rf CCP plasma; Submicron particles; Wannier's theory

Indexed keywords

CAPACITIVELY COUPLED PLASMA REACTOR; PARTICLE FREE PROCESS; PARTICLE TRAPPING; SUBMICRON PARTICLES; WANNIER THEORY;

CHARGED PARTICLES; CHEMICAL REACTORS; FLOW OF FLUIDS; MATHEMATICAL MODELS; NUMERICAL METHODS; PARTICLE SIZE ANALYSIS; TRANSPORT PROPERTIES;

PLASMAS;

EID: 0031164280     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.3707     Document Type: Article

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