Particle formation in SiOx film deposition by low frequency plasma enhanced chemical vapor deposition

Journal of Applied Physics

Volumn 83, Issue 1, 1998, Pages 554-560

  Yamaguchi, Tomoyo ^a   Sakamoto, Naoshi ^a   Shimozuma, Mitsuo ^b   Yoshino, Masaki ^c   Tagashira, Hiroaki ^d  

^a Showa Elec Wire and Cable Co Ltd   (Japan)

^b HOKKAIDO UNIVERSITY   (Japan)

^c HOKKAIDO POLYTECHNIC COLLEGE   (Japan)

^d HOKKAIDO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343037406     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366722     Document Type: Article

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