Physical properties of osmium doped tin oxide thin films

Journal of Applied Physics

Volumn 83, Issue 4, 1998, Pages 2369-2371

  Rella, R ^a   Siciliano, P ^a   Vasanelli, L ^a   Gerardi, C ^b   Licciulli, A ^b  

^a Istituto per lo Studio di Nuovi   (Italy)

^b Centro Nazionale per la Ricerca e lo Sviluppo dei Materiali   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000244980     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366982     Document Type: Article

References (12)

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