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Volumn 59, Issue 6, 1999, Pages 3969-3980

Defect migration in crystalline silicon

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Indexed keywords


EID: 0001476184     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.59.3969     Document Type: Article
Times cited : (371)

References (54)
  • 4
    • 0004076443 scopus 로고
    • VCH, Wernheim E. J. Kramer P. Haasen R. W. Cahn
    • G. D. Watkins, in Materials Science and Technology, edited by R. W. Cahn, P. Haasen, and E. J. Kramer (VCH, Wernheim, 1991), Vol. 4.
    • (1991) Materials Science and Technology
    • Watkins, G.D.1
  • 31
    • 0004002033 scopus 로고
    • Mathematical Association of America, Washington, DC
    • F. S. Acton, Numerical Methods That Work (Mathematical Association of America, Washington, DC, 1990), p. 204.
    • (1990) Numerical Methods That Work , pp. 204
    • Acton, F.S.1
  • 50
    • 85038341601 scopus 로고    scopus 로고
    • Animated versions of these pathways may be found on our website at http://brian.ch.cam.ac.uk/(Formula presented)lindsey/silicon.html
    • Animated versions of these pathways may be found on our website at http://brian.ch.cam.ac.uk/(Formula presented)lindsey/silicon.html


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.