A plasma process for ultrafast deposition of SiGe graded buffer layers

Applied Physics Letters

Volumn 76, Issue 4, 2000, Pages 427-429

  Rosenblad, C ^a   Von Kanel H ^a   Kummer, M ^b   Dommann, A ^b   Muller E ^c  

^a ETH ZURICH   (Switzerland)

^b Interstaatliche Fachhochschule T   (Switzerland)

^c PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001445067     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125776     Document Type: Article

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