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Volumn 77, Issue 12, 2000, Pages 1840-1842

Effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-Si1-xGex layers

(5) Senapati, B b Samanta, S K b Maikap, S b Bera, L K a,b Maiti, C K b

a NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

b Department of Electronics (India)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001438935 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1311311 Document Type: Article

Times cited : (11)

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