The interstitial fraction of diffusivity of common dopants in Si

Applied Physics Letters

Volumn 71, Issue 26, 1997, Pages 3862-3864

  Gossmann, H J ^a   Haynes, T E ^b   Stolk, P A ^a,d   Jacobson, D C ^a   Gilmer, G H ^a   Poate, J M ^a,e   Luftman, H S ^a   Mogi, T K ^c,f   Thompson, M O ^c  

^a LUCENT TECHNOLOGIES   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

^c Cornell University   (United States)

^d PHILIPS RESEARCH LABORATORIES   (Netherlands)

^e NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^f MCKINSEY AND COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001528106     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120527     Document Type: Article

References (29)

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