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Volumn 73, Issue 12, 1998, Pages 1706-1708

Experimental evidence for a dual vacancy-interstitial mechanism of self-diffusion in silicon

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001101890     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122252     Document Type: Article
Times cited : (39)

References (13)
  • 10
    • 21544470512 scopus 로고    scopus 로고
    • TSUPREM-4 computer code from Avant! Corporation, Fremont, CA
    • TSUPREM-4 computer code from Avant! Corporation, Fremont, CA.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.