Aberration effects in the region of 0.18 um lithography with KrF excimer stepper

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 714-723

  Yim, Donggyu ^a   Lim, Chang M ^a   Kim, Hyeong Soo ^a   Baik, Ki Ho ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; EXCIMER LASERS; RANDOM ACCESS STORAGE; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET; DRAM; KRYPTON FLUORIDE; OPTICAL MICROLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0031356733     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)