Analysis of nonlinear overlay errors by aperture mixing related with pattern asymmetry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 106-115

  Lim, Chang M ^a   Kwon, Ki Sung ^a   Yim, Donggyu ^a   Son, Dong Hwan ^a   Kim, Hyeong Soo ^a   Baik, Ki Ho ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; ERROR ANALYSIS; LENSES; MASKS; PHASE SHIFT; SEMICONDUCTOR DEVICE MANUFACTURE;

OPTICAL MICROLITHOGRAPHY; RESOLUTION ENHANCEMENT;

PHOTOLITHOGRAPHY;

EID: 0031336765     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.276014     Document Type: Conference Paper

References (8)