Optical proximity correction of alternating phase-shift masks for 0.18-um KrF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 751-762

  Yasuzato, Tadao ^a   Ishida, Shinji ^a   Shioiri, Satomi ^a   Tanabe, Hiroyoshi ^a   Kasama, Kunihiko ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; EXCIMER LASERS; MASKS; PHASE SHIFT; PROXIMITY SENSORS; RANDOM ACCESS STORAGE;

DRAM; KRYPTON FLUORIDE; OPTICAL MICROLITHOGRAPHY; OPTICAL PROXIMITY CORRECTION;

PHOTOLITHOGRAPHY;

EID: 0031365075     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275992     Document Type: Conference Paper

References (5)