In-situ reflectance monitoring during MOCVD of AlGaN

Journal of Electronic Materials

Volumn 27, Issue 4, 1998, Pages 190-195

  Ng, T B ^c   Han, J ^a   Biefeld, R M ^a   Weckwerth, M V ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b Star Medical Technologies Inc   (United States)

^c NONE

Author keywords

AlGaN; In situ; Metalorganic chemical vapor deposition (MOCVD); Reflectance

Indexed keywords

EID: 0001123587     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-998-0385-8     Document Type: Article

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