Properties of sputtered TaReGe used as an x-ray mask absorber material

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3491-3494

  Yoshihara, Takuya ^a   Kotsuji, Setsu ^a   Fujii, Kiyoshi ^a   Tsuboi, Shinji ^a   Suzuki, Katsumi ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001031023     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590483     Document Type: Article

References (11)

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