Internal stress and microstructure of WNx bilayer films for X-ray masks

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7570-7574

  Lee, Don Hee ^a   Park, Chil Keun ^a   Song, Ki Chang ^a   Jeon, Young Sam ^a   Lee, Tae Ho ^b   Jeong, Chang Young ^b   Ahn, Jinho ^b  

^a LG   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

Absorber; Step annealing; Stress; WNx bilayer; X ray mask

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; FILM PREPARATION; MASKS; PHASE TRANSITIONS; RESIDUAL STRESSES; SPUTTERING; SURFACE ROUGHNESS; TUNGSTEN ALLOYS;

BILAYER FILMS; STEP ANNEALING; X RAY MASKS;

X RAY LITHOGRAPHY;

EID: 0031368699     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7570     Document Type: Article

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