Origin of stress distribution in sputtered x-ray absorber film

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2483-2488

  Iba, Yoshihisa ^a   Kumasaka, Fumiaki ^a   Aoyama, Hajime ^a   Taguchi, Takao ^a   Yamabe, Masaki ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004864986     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589671     Document Type: Article

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