SCOPUS 정보 검색 플랫폼

Volumn 12, Issue 4, 1999, Pages 679-686

Optimization of a top-surface imaging process for 193-nm lithography

Author keywords

ArF lithography; Dry development; Line Edge Roughness; Linearity; Silylation; Top Surface Imaging

Indexed keywords

EID: 0000990894 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.12.679 Document Type: Article

Times cited : (4)

References (8)

1
- 0001369643
- Gas phase silylation in the diffusion enhanced silylation resist process for application to sub-0.5μm optical lithography
- K. H. Baik, L. Van den Hove, A. M. Goethals, M. Op de Beeks, and B. Roland, "Gas phase silylation in the diffusion enhanced silylation resist process for application to sub-0.5μm optical lithography", J. Vac. Sci. & Tech., B8(6), 1481 (1990)
- (1990) J. Vac. Sci. & Tech. , vol.B8 , Issue.6 , pp. 1481
- Baik, K.H.¹ Van Den Hove, L.² Goethals, A.M.³ Op De Beeks, M.⁴ Roland, B.⁵

2
- 0030314888
- Top surface imaging and Optical Proximity Correction: A way to 0.18 μm lithography at 248nm
- A. M. Goethals, J. Vertommen, F. Van Roey, A. Trichkov, K. Ronse, R. Jonckheere, and L. Van den hove, 'Top surface imaging and Optical Proximity Correction: A way to 0.18 μm lithography at 248nm", SPIE, Vol. 2726,362 (1996)
- (1996) SPIE , vol.2726 , pp. 362
- Goethals, A.M.¹ Vertommen, J.² Van Roey, F.³ Trichkov, A.⁴ Ronse, K.⁵ Jonckheere, R.⁶ Van Den Hove, L.⁷

3
- 11744386910
- Reduction of line edge roughness in the top surface imaging process
- S. Mori, T. Morisawa, N. Matsuzawa, Y. Kaimoto, M. Endo, T. Matsuo, K. Kuhara, and M. Sasago, "Reduction of line edge roughness in the top surface imaging process", J. Vac. Sci. Tech., B16(6), 3739 (1998)
- (1998) J. Vac. Sci. Tech. , vol.B16 , Issue.6 , pp. 3739
- Mori, S.¹ Morisawa, T.² Matsuzawa, N.³ Kaimoto, Y.⁴ Endo, M.⁵ Matsuo, T.⁶ Kuhara, K.⁷ Sasago, M.⁸

4
- 0001370606
- Top Surface Imaging for Extreme Ultraviolet Lithography
- C. Henderson, D. Wheeler, T. Pollagi, G Cardinale, D. O'Connell, A. Fisher, V. Rao, and J. Goldsmith, "Top Surface Imaging for Extreme Ultraviolet Lithography", J. Photopolymer Sci. & Tech. Vol. 11, 459 (1998)
- (1998) J. Photopolymer Sci. & Tech. , vol.11 , pp. 459
- Henderson, C.¹ Wheeler, D.² Pollagi, T.³ Cardinale, G.⁴ O'Connell, D.⁵ Fisher, A.⁶ Rao, V.⁷ Goldsmith, J.⁸

5
- 16844377450
- Wet-silylation process for X-ray and EUV lithographies
- H. Oizumi, Y. Yamashita, T. Ogawa, and M. Ohtani, "Wet-silylation process for X-ray and EUV lithographies", J. Photopolymer Sci. & Tech. Vol. 9, 627 (1996)
- (1996) J. Photopolymer Sci. & Tech. , vol.9 , pp. 627
- Oizumi, H.¹ Yamashita, Y.² Ogawa, T.³ Ohtani, M.⁴

6
- 0004093537
- American Chemical Society
- L. F. Thompson, C. G. Willson, and M. J. Bowden, "Introduction to Microlithography, 2nd ed.", American Chemical Society (1994)
- (1994) Introduction to Microlithography, 2nd Ed.
- Thompson, L.F.¹ Willson, C.G.² Bowden, M.J.³

7
- 84913155226
- An Aqueous Base Developable Novel Deep-UV Resist for KrF Excimer Laser Lithography
- M. Murata, E. Kobayashi, Y. Yumoto, T. Miura, and T. Yamaoka, "An Aqueous Base Developable Novel Deep-UV Resist for KrF Excimer Laser Lithography", J. Photopolymer Sci. & Tech. Vol. 4, 509 (1991)
- (1991) J. Photopolymer Sci. & Tech. , vol.4 , pp. 509
- Murata, M.¹ Kobayashi, E.² Yumoto, Y.³ Miura, T.⁴ Yamaoka, T.⁵

8
- 17144407807
- Silylation for Carboxylic Acids
- Y. Kaimoto, S. Mori, N. Matsuzawa, K. Kuhara, and M. Sasago, "Silylation for Carboxylic Acids", J. Photopolymer Sci. & Tech. Vol. 11, 633 (1998)
- (1998) J. Photopolymer Sci. & Tech. , vol.11 , pp. 633
- Kaimoto, Y.¹ Mori, S.² Matsuzawa, N.³ Kuhara, K.⁴ Sasago, M.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.